Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.
More Standards PDF
AS 3789.2-1991
$61.00 $122.00
AS 3870-1991
$25.00 $50.00
AS 3697-1991
$55.00 $111.00
AS 3583.4-1991
$14.00 $28.00